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1. Identity statement
Reference TypeJournal Article
Sitemtc-m21c.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier8JMKD3MGP3W34R/3UQ6RKB
Repositorysid.inpe.br/mtc-m21c/2020/01.20.10.09   (restricted access)
Last Update2020:01.20.10.09.00 (UTC) simone
Metadata Repositorysid.inpe.br/mtc-m21c/2020/01.20.10.09.01
Metadata Last Update2022:01.04.01.34.57 (UTC) administrator
DOI10.1016/j.apsusc.2019.145232
ISSN0169-4332
Citation KeySilvaUedaMell:2020:MeCySi
TitleMetal Cylindrical Sieve (MCS) for plasma confinement and low sputteringnitrogen plasma immersion ion implantation
Year2020
MonthApr.
Access Date2024, May 19
Type of Workjournal article
Secondary TypePRE PI
Number of Files1
Size1044 KiB
2. Context
Author1 Silva, Carla da
2 Ueda, Mário
3 Mello, Carina Barros
Resume Identifier1
2 8JMKD3MGP5W/3C9JHSB
Group1
2 LABAP-COCTE-INPE-MCTIC-GOV-BR
3 LABAP-COCTE-INPE-MCTIC-GOV-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
Author e-Mail Address1 carla.silva@inpe.br
2 mario.ueda@inpe.br
3 carina.mello@inpe.br
JournalApplied Surface Science
Volume509
Pagese145232
Secondary MarkA1_INTERDISCIPLINAR A1_ENGENHARIAS_II A1_ENGENHARIAS_I A2_SAÚDE_COLETIVA A2_MATERIAIS A2_ENGENHARIAS_III A2_CIÊNCIAS_AGRÁRIAS_I B1_QUÍMICA B1_ODONTOLOGIA B1_MEDICINA_III B1_MEDICINA_II B1_MATEMÁTICA_/_PROBABILIDADE_E_ESTATÍSTICA B1_GEOCIÊNCIAS B1_FARMÁCIA B1_ENGENHARIAS_IV B1_CIÊNCIAS_BIOLÓGICAS_I B1_BIOTECNOLOGIA B2_ENSINO B2_CIÊNCIAS_BIOLÓGICAS_II B2_ASTRONOMIA_/_FÍSICA C_BIODIVERSIDADE
History (UTC)2020-01-20 10:09:01 :: simone -> administrator ::
2020-01-20 10:09:01 :: administrator -> simone :: 2020
2020-01-20 10:09:23 :: simone -> administrator :: 2020
2022-01-04 01:34:57 :: administrator -> simone :: 2020
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Version Typepublisher
KeywordsIon implantation
Surface modification
Hollow cathode discharge
Deposition in metallic tubes
SS308L MCS tubes
AbstractNitrogen Plasma Immersion Ion Implantation (N-PIII) was performed in the Metal Cylindrical Sieve (MCS) configuration that consists of Stainless Steel 308 L (SS308L) spiral spring wound wire. Two N-PIII regimes were obtained: one using a current of 5 A (with ends open), in which an intense sputtering of the wire occurs while for currents above 12 A (with one side closed), the sputtering is diminished substantially. This behavior at different powers in MCS can be explained in terms of the sheath overlapping between the spiral spring paths. The plasma density near the wire is insufficient to overcome the sheath overlapping between the spiral spring paths when the current is low, which leads to high sputtering of the wire surface. However, in high current, sheath overlapping is avoided and high ion implantation condition is achieved. FEG-SEM analyses of the silicon sample placed on the screen plate in front of MCS mouth indicated a high deposition of the sputtered material at low current in contrast with low deposition at high current. These deposition free results allow us to plan efficient N-PIII treatments of different types and sizes of metal springs, grids, rings, and wires, with high performance, for industrial and scientific applications.
AreaFISPLASMA
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4. Conditions of access and use
Languageen
Target Filesilva_metal.pdf
User Groupsimone
Reader Groupadministrator
simone
Visibilityshown
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
Update Permissionnot transferred
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ET2RFS
Citing Item Listsid.inpe.br/bibdigital/2013/09.25.21.49 2
sid.inpe.br/mtc-m21/2012/07.13.14.56.06 1
DisseminationWEBSCI; PORTALCAPES; COMPENDEX.
Host Collectionurlib.net/www/2017/11.22.19.04
6. Notes
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